Influence of colloidal silica dispersion on the decrease of roughness in silicon chemical mechanical polishing-Reference-Cited by-同舟云学术

Influence of colloidal silica dispersion on the decrease of roughness in silicon chemical mechanical polishing

Author:

Chen Gaopan¹²³,Luo Guihai¹²³,Pan Guoshun¹²³,Liu Yuhong¹,Luo Haimen¹²³

Affiliation:

1. State Key Laboratory of TribologyTsinghua UniversityBeijing100084People's Republic of China

2. Shenzhen Key Laboratory of Micro/nano ManufacturingResearch Institute of Tsinghua University in ShenzhenShenzhen518057People's Republic of China

3. Guangdong Provincial Key Laboratory of OptomechatronicsShenzhen518057People's Republic of China

Funder

Foundation for Innovative Research Groups of the National Natural Science Foundation of China

National Natural Science Foundation of China

Publisher

Institution of Engineering and Technology (IET)

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,Bioengineering

Link

Reference22 articles.

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