Investigation of anodic silicon dioxide thin films for microelectromechanical systems applications-Reference-Cited by-同舟云学术

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Investigation of anodic silicon dioxide thin films for microelectromechanical systems applications

Published:2014-12 Issue:12 Volume:9 Page:830-834
ISSN:1750-0443
Container-title:Micro & Nano Letters
language:en
Short-container-title:Micro & Nano Letters

Author:

Ashok Akarapu¹,Pal Prem¹

Affiliation:

1. MEMS and Micro/Nano Systems LaboratoryDepartment of PhysicsIndian Institute of TechnologyHyderabadIndia

Publisher

Institution of Engineering and Technology (IET)

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,Bioengineering

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1049/mnl.2014.0360

Reference28 articles.

1. Silicon dioxide microcantilever with piezoresistive element integrated for portable ultraresoluble gaseous detection

2. General Relationship for the Thermal Oxidation of Silicon

3. A New Design of Anodic Oxidation Reactor for High‐Quality Gate Oxide Preparation

4. Process-dependent thermal transport properties of silicon-dioxide films deposited using low-pressure chemical vapor deposition

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