Radio-frequency capacitively coupled plasmas in hydrogen excited by tailored voltage waveforms: comparison of simulations with experiments-Reference-Cited by-同舟云学术

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Radio-frequency capacitively coupled plasmas in hydrogen excited by tailored voltage waveforms: comparison of simulations with experiments

Published:2014-11-11 Issue:6 Volume:23 Page:065049
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Diomede P,Economou D J,Lafleur T,Booth J-P,Longo S

Funder

National Science Foundation

Department of Energy, Office of Fusion Energy Science

Agence Nationale de le Recherche

Ministero dell'Istruzione, dell'Università e della Ricerca

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://stacks.iop.org/0963-0252/23/i=6/a=065049/pdf

Reference34 articles.

1. Principles of Plasma Discharges and Materials Processing

2. The electrical asymmetry effect in capacitively coupled radio-frequency discharges

3. PIC simulations of the separate control of ion flux and energy in CCRF discharges via the electrical asymmetry effect

4. Control of ion energy distribution at substrates during plasma processing

5. Nanocrystalline silicon film growth morphology control through RF waveform tailoring

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