Numerical characterization of dual-frequency capacitively coupled plasmas modulated by electron beam injection

Abstract

Abstract The modulated approach of electron beam (EB) injection can achieve favorable parameters for capacitive coupled plasmas (CCP). In this work, a one-dimensional particle-in-cell/Monte Carlo collision (PIC/MCC) model is used to simulate the stable dual-frequency CCP with EB injection. First, when the parameters of EB are kept constant at 0.01 A and 30 eV, the results demonstrate significant enhancements in electron density, self-bias voltage, and ion flux. Furthermore, the electron energy probability function (EEPF) appears to have a transition from a typical bi-Maxwellian distribution to a Maxwellian distribution, and the dominant heating mode shifts from the α-mode to the α-γ-mode. Secondly, when the EB current and energy are all changed, the basic parameters of DF-CCP can be achieved by different modulations. Furthermore, we also discuss the transition of the electron heating mode as the current increases from 0.001 A to 1 A and the energy increases from 10 eV to 490 eV. In particular, we conduct a comparative study among different cases of EB injection. According to these results, the modulation capability of EB injection in DF-CCP is thoroughly investigated, which can greatly benefit atom-scale etching in practical applications.