Mass spectrometry detection of radicals in SiH4-CH4-H2glow discharge plasmas
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference44 articles.
1. Spatial Distribution of SiH3Radicals in RF Silane Plasma
2. Radical species in argon‐silane discharges
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5. Measurement of SiH2Densities in an RF-Discharge Silane Plasmae Used in the Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Film
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