Spatial Distribution of SiH3Radicals in RF Silane Plasma-Reference-Cited by-同舟云学术

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Spatial Distribution of SiH3Radicals in RF Silane Plasma

Published:1990-03-20 Issue:Part 2, No. 3 Volume:29 Page:L505-L507
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Itabashi Naoshi,Nishiwaki Nobuki,Magane Mitsuo,Naito Susumu,Goto Toshio,Matsuda Akihisa,Yamada Chikashi,Hirota Eizi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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