Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/24/i=3/a=035003/pdf
Reference18 articles.
1. EUV Sources for Lithography
2. Extreme ultraviolet lithography: overview and development status
3. Nanometer interface and materials control for multilayer EUV-optical applications
4. Detection and characterization of carbon contamination on EUV multilayer mirrors
5. Atomic Hydrogen Cleaning of Surface Ru Oxide Formed by Extreme Ultraviolet Irradiation of Ru-Capped Multilayer Mirrors in H2O Ambience
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography;Advanced Materials Interfaces;2023-12-14
2. Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests;Journal of Vacuum Science & Technology B;2023-01-01
3. The development of laser-produced plasma EUV light source;Chip;2022-09
4. Research on efficient and stable control of EUV-induced hydrogen plasma;Journal of Applied Physics;2022-06-21
5. Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning;IEEE Transactions on Plasma Science;2021-10
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3