Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning-Reference-Cited by-同舟云学术

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Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning

Published:2021-10 Issue:10 Volume:49 Page:3132-3141
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

van Veldhoven Jacqueline,Stodolna Aneta S.,Storm Arnold,van den Brink Jeroen,Geerits Niels,Vlaar Jasper,Dekker Michael,Ushakov Andrey^ORCID

Funder

Netherlands Top Consortium for Knowledge and Innovation Research Grant (Dutch: “Topconsortia voor Kennis en Innovatie”) in 2019

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Condensed Matter Physics,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx7/27/9570824/09537914.pdf?arnumber=9537914

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications;Journal of Vacuum Science & Technology B;2024-08-06

2. Insight into the Re-Deposition Equilibrium of Sn Contaminant on Euv Multi-Layer Mirror Surface During Hydrogen Plasma Cleaning;2024

3. Investigation of the Ion Thermal Effect on Tin Contamination in Low-Temperature Hydrogen Plasma Cleaning;2024

4. In-situ non-destructive removal of tin particles by low-energy plasma for imitation of EUV optical mirrors self-cleaning;Vacuum;2023-06

5. Development of ionic liquid circulation system in high-vacuum chamber for semiconductor device fabrication;Vacuum;2023-01

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