On the hexamethyldisiloxane dissociation paths in a remote Ar-fed expanding thermal plasma
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference62 articles.
1. Plasma-Polymerized Organosilicones and Organometallics
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4. Expanding thermal plasma for low-k dielectrics: engineering the film chemistry by means of specific dissociation paths in the plasma
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