Plasma-Polymerized Organosilicones and Organometallics-Reference-Cited by-同舟云学术

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Plasma-Polymerized Organosilicones and Organometallics

Published:1990 Issue: Volume: Page:163-268
ISSN:
Container-title:Plasma Deposition, Treatment, and Etching of Polymers
language:
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Author:

Wróbel A.M.,Wertheimer M.R.

Publisher

Elsevier

Reference268 articles.

1. Characterization of plasma-deposited organosilicon thin films;Sachdev;Thin Solid Films,1983

2. Polysilicon technology;Crossman,1977

3. Czochralski silicon pull rate limits;Rea;J. Cryst. Growth,1981

4. Crystals-Growth, Properties, Applications, Vol. 5. Silicon.;Dietze,1981

5. Applications of Plasma Processes to VLSI Technology.;Sugano,1985

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1. Energetics of reactions in an atmospheric pressure plasma jet with argon carrier gas and hexamethyldisiloxane reagent;Plasma Processes and Polymers;2023-10-15

2. Technical Applications;Nonthermal Plasmas for Materials Processing;2022-07-15

3. On improved understanding of plasma-chemical processes in complex low-temperature plasmas;The European Physical Journal D;2018-05

4. Energy Conversion Efficiency in Low- and Atmospheric-Pressure Plasma Polymerization Processes, Part II: HMDSO;Plasma Chemistry and Plasma Processing;2016-10-28

5. Spectroscopic studies of microwave plasmas containing hexamethyldisiloxane;Journal of Physics D: Applied Physics;2016-09-08

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