Spectroscopic studies of microwave plasmas containing hexamethyldisiloxane-Reference-Cited by-同舟云学术

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Spectroscopic studies of microwave plasmas containing hexamethyldisiloxane

Published:2016-09-08 Issue:39 Volume:49 Page:395206
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Nave A S C,Mitschker F,Awakowicz P,Röpcke J

Funder

Sonderforschungsbereich Transregio 24

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/49/i=39/a=395206/pdf

Reference56 articles.

1. Plasma-Polymerized Organosilicones and Organometallics

2. Atmospheric plasmas for thin film deposition: A critical review

3. Mass Spectral Investigation of the Radio-Frequency Plasma Deposition of Hexamethyldisiloxane

4. Kinetics and products of the gas-phase reactions of (CH3)4Si, (CH3)3SiCH2OH, (CH3)3SiOSi(CH3)3 and (CD3)3SiOSi(CD3)3 with Cl atoms and OH radicals

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1. PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth;Plasma Processes and Polymers;2023-10-30

2. Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition;Plasma Processes and Polymers;2023-04-10

3. Distribution of the Deposition Rates in an Industrial-Size PECVD Reactor Using HMDSO Precursor;Coatings;2021-10-05

4. A numerical analysis of a microwave induced coaxial surface wave discharge fed with a mixture of oxygen and hexamethyldisiloxane for the purpose of deposition;Plasma Sources Science and Technology;2019-11-01

5. Characterization of Gaseous Plasma Sustained in Mixtures of HMDSO and O2 in an Industrial-Scale Reactor;Plasma Chemistry and Plasma Processing;2019-09-04

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