Mass Spectral Investigation of the Radio-Frequency Plasma Deposition of Hexamethyldisiloxane-Reference-Cited by-同舟云学术

Mass Spectral Investigation of the Radio-Frequency Plasma Deposition of Hexamethyldisiloxane

Published:1997-05-01 Issue:18 Volume:101 Page:3614-3619
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Alexander M. R.¹,Jones F. R.¹,Short R. D.¹

Affiliation:

1. Department of Engineering Materials, Laboratory for Surface and Interface Analysis, University of Sheffield, Sir Robert Hadfield Building, Mappin Street, Sheffield, U.K. S1 4DU

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp970663b

Reference16 articles.

1. An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/ oxygen plasmas

Cited by 87 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Layer-by-layer structured nanocomposite deposits from plasma-synthesized organosilicon nanoparticles and organosilicon nanoparticles decorated with Ag nanoparticles by taking advantage of cyclic nanoparticle formation in Ar/HMDSO reactive plasmas;Frontiers in Nanotechnology;2024-04-11

2. Simulation study of organosilicon coating of a spherical nanoparticle immersed in a low-pressure HMDSO/O₂ plasma;Physica Scripta;2023-11-30

3. Foundations of plasma enhanced chemical vapor deposition of functional coatings;Plasma Sources Science and Technology;2023-07-01

4. Mass spectroscopy of oxygen plasmas with energetic ions;AIP Advances;2023-06-01

5. The role of plasma technology in barrier coating deposition;Reviews of Modern Plasma Physics;2022-09-07