In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition-Reference-Cited by-同舟云学术

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In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Published:2009-03-13 Issue:7 Volume:42 Page:073001
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Langereis E,Heil S B S,Knoops H C M,Keuning W,van de Sanden M C M,Kessels W M M

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/42/i=7/a=073001/pdf

Reference83 articles.

1. Atomic layer epitaxy

2. Surface Chemistry for Atomic Layer Growth

3. Atomic layer deposition

4. Atomic layer deposition (ALD): from precursors to thin film structures

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