On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor-Reference-Cited by-同舟云学术

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On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor

Published:2010-11-02 Issue:46 Volume:43 Page:465201
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Cormier Pierre-Antoine,Stahl Marc,Thomann Anne-Lise,Dussart Rémi,Wolter Matthias,Semmar Nadjib,Mathias Jacky,Kersten Holger

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma

2. The energy balance at substrate surfaces during plasma processing

3. Theoretical and experimental determination of the energy flux during magnetron sputter deposition onto an unbiased substrate

4. Energy spectra of reflected and sputtered particles in magnetron deposition systems

5. Substrate heating in cylindrical magnetron sputtering sources

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2. The influence of pulse duration and duty cycle on the energy flux to the substrate in high power impulse magnetron sputtering;Vacuum;2023-10

3. Modeling of Reactive Sputtering—History and Development;Materials;2023-04-20

4. Foundations of plasma surface functionalization of polymers for industrial and biological applications;Plasma Sources Science and Technology;2022-10-01

5. The importance of discharge voltage in DC magnetron sputtering for energy of sputtered and backscattered atoms on the substrate: Monte-Carlo simulations;Vacuum;2022-02

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