The importance of discharge voltage in DC magnetron sputtering for energy of sputtered and backscattered atoms on the substrate: Monte-Carlo simulations-Reference-Cited by-同舟云学术

The importance of discharge voltage in DC magnetron sputtering for energy of sputtered and backscattered atoms on the substrate: Monte-Carlo simulations

Published:2022-02 Issue: Volume:196 Page:110716
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Farhadizadeh Alireza^ORCID,Kozák Tomáš

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference63 articles.

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5. Role of Tin+ and Aln+ ion irradiation (n=1, 2) during Ti1-xAlxN alloy film growth in a hybrid HIPIMS/magnetron mode;Greczynski;Surf. Coating. Technol.,2012

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