Low-kfilms modification under EUV and VUV radiation-Reference-Cited by-同舟云学术

Low-kfilms modification under EUV and VUV radiation

Published:2013-12-11 Issue:2 Volume:47 Page:025102
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Rakhimova T V,Rakhimov A T,Mankelevich Yu A,Lopaev D V,Kovalev A S,Vasil'eva A N,Zyryanov S M,Kurchikov K,Proshina O V,Voloshin D G,Novikova N N,Krishtab M B,Baklanov M R

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/47/i=2/a=025102/pdf

Reference44 articles.

1. Low dielectric constant materials for microelectronics

2. Low Dielectric Constant Materials

3. Plasma processing of low-k dielectrics

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