Challenges in scaling of IPVD deposited Ta barriers on OSG low‐k films: Carbonization of Ta by CHx radicals generated through VUV‐induced decomposition of carbon‐containing groups

Author:

Ryabinkin Alexey N.1ORCID,Vishnevskiy Alexey S.2,Naumov Sergej3,Serov Alexander O.1,Maslakov Konstantin I.4,Seregin Dmitry S.2,Vorotyntsev Dmitry A.2,Pal Alexander F.1,Rakhimova Tatyana V.1,Vorotilov Konstantin A.2,Baklanov Mikhail R.25

Affiliation:

1. Skobeltsyn Institute of Nuclear Physics Lomonosov Moscow State University (SINP MSU) Moscow Russian Federation

2. Research and educational center “Technological Center” MIREA─Russian Technological University (RTU MIREA) Moscow Russian Federation

3. Leibniz Institute of Surface Engineering (IOM) Leipzig Germany

4. Department of Chemistry Lomonosov Moscow State University Moscow Russian Federation

5. European Centre for Knowledge and Technology Transfer (EUROTEX) Brussels Belgium

Abstract

AbstractThe effect of vacuum ultraviolet (VUV) radiation during ionized physical vapor deposition (IPVD) of tantalum barriers on various porous organosilicate glass low‐k SiCOH films is studied using advanced diagnostics and quantum chemical calculations. VUV photons break the Si–C bonds, releasing hydrocarbon radicals from the pore surfaces. These radicals, trapped in pores that are partially sealed by tantalum deposition, can either react with tantalum to form carbide‐like compounds, TaCx, or be redeposited in the pores as CHx polymers. This is evidenced by a decrease in CH3 groups that correlates with an increase in TaCx. The formation of TaCx poses a significant challenge in the back end of line (BEOL) technology when reducing the barrier thickness.

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3