Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency Configurations
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference27 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Dual excitation reactive ion etcher for low energy plasma processing
3. Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices
4. Analytic model for a dual frequency capacitive discharge
5. A time-dependent analytical sheath model for dual-frequency capacitively coupled plasma
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1. Simulations of standing wave effect, stop band effect, and skin effect in large-area very high frequency symmetric capacitive discharges;Plasma Science and Technology;2021-02-26
2. Effects of HF frequency on plasma characteristics in dual-frequency helium discharge at atmospheric pressure by fluid modeling;Plasma Science and Technology;2018-09-04
3. Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model;Chinese Physics B;2017-12
4. On singlet metastable states, ion flux and ion energy in single and dual frequency capacitively coupled oxygen discharges;Journal of Physics D: Applied Physics;2017-03-27
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