Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/1674-1056/26/12/125201/pdf
Reference31 articles.
1. Analytic model for a dual frequency capacitive discharge
2. Dual-frequency capacitive discharges: Effect of low-frequency current on electron distribution function
3. Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics
4. Stochastic heating in single and dual frequency capacitive discharges
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The Effective Capacitance Behaviour of Argon Plasma Exposed Al Dopped CdO Electrode Used in Efficient Metal ‐Air Batteries;ChemistrySelect;2024-07-23
2. Effect of Multi-Frequency Excitation on Dust Particle Charging in Weakly Collisional Radio-Frequency Capacitive Discharge;Plasma Physics Reports;2024-05
3. Simulation of argon-excited microwave plasma reactor for green energy and CO2 conversion application;Applied Energy;2024-01
4. Parametric Studies of CCRF in Ar on 1D Model: Effect of Pressure and Dielectric Layers;Fusion Science and Technology;2023-01-17
5. Influence of an Alternating Phase on the Electron Heating in Capacitively Coupled Radio-Frequency Discharges;Lecture Notes in Electrical Engineering;2023
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3