Analytic model for a dual frequency capacitive discharge
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1621000
Reference19 articles.
1. Dual excitation reactive ion etcher for low energy plasma processing
2. Independent control of ion density and ion bombardment energy in a dual RF excitation plasma
3. High selectivity plasma etching of silicon dioxide with a dual frequency 27/2 MHz capacitive radio frequency discharge
4. Dually driven radio frequency plasma simulation with a three moment model
5. Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
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