Laser-Produced Plasma Sources for High-Volume-Manufacturing EUV Lithography
Author:
Affiliation:
1. ASML US LP, San Diego, California, USA
Publisher
Informa UK Limited
Subject
Nuclear and High Energy Physics,Atomic and Molecular Physics, and Optics
Link
https://www.tandfonline.com/doi/pdf/10.1080/08940886.2019.1634430
Reference21 articles.
1. High-NA EUV lithography exposure tool progress
2. High NA EUV lithography: Next step in EUV imaging
3. EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update
4. Laser produced plasma EUV sources for HVM 7nm node lithography: progress in availability and prospects of power scaling
5. Performance optimization of MOPA pre-pulse LPP light source
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review;High Power Laser Science and Engineering;2023
2. Advanced Lithography;Springer Handbook of Semiconductor Devices;2022-11-11
3. Mitigating jitter in droplet stream by uniform charging;Physics of Fluids;2022-11
4. The development of laser-produced plasma EUV light source;Chip;2022-09
5. Monitoring the Temperature of a Mo/Si Mirror with Photoluminescence in Extreme-Ultraviolet Lithography;ACS APPL ELECTRON MA;2022
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3