High NA EUV lithography: Next step in EUV imaging-Reference-Cited by-同舟云学术

High NA EUV lithography: Next step in EUV imaging

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography X
language:
Short-container-title:

Author:

van Setten Eelco,Bottiglieri Gerardo,McNamara John,van Schoot Jan,Troost Kars,Zekry Joseph,Fliervoet Timon,Hsu Stephen,Zimmermann Joerg,Roesch Matthias,Bilski Bartosz,Graeupner Paul

Publisher

SPIE

Reference18 articles.

1. Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner;van de Kerkhof,2017

2. EUV lithography scanner for sub 8 nm resolution;van Schoot,2015

3. The future of EUV lithography: enabling Moore’s law in the next decade;Pirati,2017

4. High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond;van Schoot;J. Micro/Nanolith. MEMS MOEMS,2017

5. Stochastic printing failures in extreme ultraviolet lithography

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hyper NA EUV lithography: an imaging perspective;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-14

2. e-beam metrology of thin resist for high NA EUVL;Japanese Journal of Applied Physics;2023-04-14

3. Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography;Japanese Journal of Applied Physics;2023-01-01

4. Ultrasensitive metal-organic cluster resist for patterning of single exposure high numerical aperture extreme ultraviolet lithography applications;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-12-27

5. Multibeam mask requirements for advanced EUV patterning;Photomask Technology 2022;2022-12-01