Advanced Lithography
Author:
Publisher
Springer International Publishing
Link
https://link.springer.com/content/pdf/10.1007/978-3-030-79827-7_8
Reference45 articles.
1. Pati, Y.C., Kailath, T.: Phase-shifting masks for microlithography: automated design and mask requirements. J. Opt. Soc. Am. A Opt. Image Sci. Vis. 11, 2438–2452 (1994)
2. Kunz, R.R., Allen, R.D., Hinsberg, W.D., Wallraf, G.M.: Acid-catalyzed single-layer resists for ArF lithography. Proc. SPIE. 1925, 167–175 (1993)
3. Rosenbluth, A.E., Bukofsky, S., Hibbs, M., Lai, K., Molless, A., Singh, R.N., Wong, A.: Optimum mask and source patterns to print a given shape. Proc. SPIE. 4346, 486–502 (2001)
4. Shen, M.-H., Zu, Y.-L., Shu, Q., Wu, Q., Liu, J.: Sub-resolution assist features challenge and solution in 28 nm active area lithography. ECS Trans. 60, 257–262 (2014)
5. Gokan, H., Esho, S., Ohnishi, Y.: Dry etch resistance of organic materials. J. Electrochem. Soc. 130, 143–146 (1983)
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