Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing-Reference-Cited by-同舟云学术

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Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing

Published:2003-07 Issue:4 Volume:21 Page:1183-1187
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Chang Cheng-Hung,Leou Keh-Chyang,Lin Chaung,Lin Tsan-Lang,Tseng Chih-Wei,Tsai Chuen-Horng

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1575222

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characteristics of Optical Emission Spectroscopy Spectrum on Graphite Deposition Process with Sputtering Method;Journal of Physics: Conference Series;2022-12-01

2. Design of optical emission spectroscopy based plasma parameter controller for real-time advanced equipment control;Computers & Chemical Engineering;2017-05

3. Development of a ridged microstrip microwave interferometer for plasma electron density measurements;Plasma Sources Science and Technology;2015-06-02

4. Non-invasive in situ plasma monitoring of reactive gases using the floating harmonic method for inductively coupled plasma etching application;Review of Scientific Instruments;2013-04

5. Real time feedback control of plasma density using a floating probe in semiconductor processing;Current Applied Physics;2013-01

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