Design of optical emission spectroscopy based plasma parameter controller for real-time advanced equipment control-Reference-Cited by-同舟云学术

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Design of optical emission spectroscopy based plasma parameter controller for real-time advanced equipment control

Published:2017-05 Issue: Volume:100 Page:38-47
ISSN:0098-1354
Container-title:Computers & Chemical Engineering
language:en
Short-container-title:Computers & Chemical Engineering

Author:

Koo Junmo,Ha Daegeun,Park Damdae,Roh Hyun-Joon,Ryu Sangwon,Kim Gon-Ho,Baek Kye Hyun,Han Chonghun

Funder

Ministry of Trade, Industry & Energy (MOTIE)

Institute of Chemical Processes

Publisher

Elsevier BV

Subject

Computer Science Applications,General Chemical Engineering

Reference11 articles.

1. Multiple input multiple output controller design to match chamber performance in plasma etching for semiconductor manufacturing;Baek;J. Vac. Sci. Technol. B: Microelectron. Nanometer Struct.,2013

2. Application of excitation cross sections to optical plasma diagnostics;Boffard;J. Phys. D: Appl. Phys.,2004

3. On a new measure of interaction for multivariable process control;Bristol;IEEE Trans. Autom. Control,1966

4. Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing;Chang;J. Vac. Sci. Technol. A,2003

5. Improvement of principal component analysis modeling for plasma etch processes through discrete wavelet transform and automatic variable selection;Ha;Comput. Chem. Eng.,2016

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characteristics of Optical Emission Spectroscopy Spectrum on Graphite Deposition Process with Sputtering Method;Journal of Physics: Conference Series;2022-12-01

2. Sparse Bayesian long short-term memory networks for computationally efficient stochastic modeling of plasma etch processes;Computers & Chemical Engineering;2022-03

3. Design of Decoupled Pi Controllers for Two-Input Two-Output Networked Control Systems with Intrinsic and Network-Induced Time Delays;Acta Mechanica et Automatica;2021-11-29

4. Evolution Process and Simulation of Advanced Equipment Manufacturing Innovation Network Based on Intelligent System;Big Data;2021-11-09

5. Use of Plasma Information in Machine-Learning-Based Fault Detection and Classification for Advanced Equipment Control;IEEE Transactions on Semiconductor Manufacturing;2021-08

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