Real time feedback control of plasma density using a floating probe in semiconductor processing
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy,General Materials Science
Reference21 articles.
1. Feedback Control of Dynamic Systems;Franklin,2002
2. Process control in semiconductor manufacturing
3. Virtual plasma equipment model: a tool for investigating feedback control in plasma processing equipment
4. Controller design issues in the feedback control of radio frequency plasma processing reactors
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