Real-time control of electron density in a capacitively coupled plasma-Reference-Cited by-同舟云学术

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Real-time control of electron density in a capacitively coupled plasma

Published:2013-05 Issue:3 Volume:31 Page:031302
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Keville Bernard,Zhang Yang,Gaman Cezar,Holohan Anthony M.,Daniels Stephen,Turner Miles M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4795207

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sparse Bayesian long short-term memory networks for computationally efficient stochastic modeling of plasma etch processes;Computers & Chemical Engineering;2022-03

2. Phenomenology-based model predictive control of electron density in Ar/SF6 capacitively coupled etch plasma;Journal of the Korean Physical Society;2022-01-13

3. Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate;Current Applied Physics;2021-12

4. Design of a self-tuning adaptive model predictive controller using recursive model parameter estimation for real-time plasma variable control;Computers & Chemical Engineering;2019-04

5. Design of optical emission spectroscopy based plasma parameter controller for real-time advanced equipment control;Computers & Chemical Engineering;2017-05

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