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Effect of ion bombardment in very-high frequency glow discharge on growth and properties of SiHx films

  • Published:1997-03 Issue:2 Volume:15 Page:298-306
  • ISSN:0734-2101
  • Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • language:en
  • Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kosarev A. I.,Smirnov A. S.,Abramov A. S.,Vinogradov A. J.,Ustavschikov A. Yu.,Shutov M. V.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Unlocking the Potential of Hafnia Ferroelectrics: Achieving High Reliability via Plasma Frequency Modulation in Very High-Frequency Plasma-Enhanced Atomic Layer Deposition;ACS Applied Electronic Materials;2024-06-24

2. Performance of heterojunction solar cells with different intrinsic a-Si:H thin layers deposited by RF- and VHF-PECVD;Journal of Materials Science: Materials in Electronics;2021-09-15

3. Very high frequency plasma reactant for atomic layer deposition;Applied Surface Science;2016-11

4. Influence of ion irradiation on internal residual stress in DLC films;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2010-10

5. Influence of ion bombardment on residual stresses in diamond-like carbon films;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2009-04
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