Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H2O and O3for atomic layer deposition of ZrO2-Reference-Cited by-同舟云学术

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Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H2O and O3for atomic layer deposition of ZrO2

Published:2019-03 Issue:2 Volume:37 Page:020912
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Seppälä Sanni¹^ORCID,Vehkamäki Marko¹,Mizohata Kenichiro²,Noh Wontae³,Räisänen Jyrki²,Ritala Mikko¹^ORCID,Leskelä Markku¹^ORCID

Affiliation:

1. Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 Helsinki, Finland

2. Division of Materials Physics, Department of Physics, University of Helsinki, P.O. Box 43, FI-00014 Helsinki, Finland

3. Air Liquide Laboratories Korea, Yonsei Engineering Research Park, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, South Korea

Funder

Academy of Finland

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5079539

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition;Surfaces and Interfaces;2024-03

2. Towards modeling of ZrO2 atomic layer deposition at reactor scale based on experimental kinetic approximation;Applied Surface Science;2024-02

3. Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor;Applied Surface Science;2023-07

4. Comprehensive investigation of Er2O3 thin films grown with different ALD approaches;Surfaces and Interfaces;2022-11

5. The effects of decomposition of CpZr(NMe2)3 on atomic layer deposition for high-k ZrO2 thin films;Materials Today Communications;2022-08

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