New Class of Zr Precursor Containing Boratabenzene Ligand Enabling Highly Conformal Wafer-Scale Zirconium Dioxide Thin Films through Atomic Layer Deposition

Author:

Ansari Mohd Zahid,Janicek Petr,NamGung Sook,Kim Hyangil,Nandi Dip K.,Cheon Taehoon,Siddiqui Masoom Raza,Imran Muhammad,Jang Yujin,Bae Jong-Seong,Hong Tae Eun,Park Chaehyun,Son Yeseul,Kim Sang Bok,Kimj Soo-Hyun

Funder

Ulsan National Institute of Science and Technology

KIAT

Motilal Nehru National Institute of Technology

Ministry of Education Youth and Sports

King Saud University

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,General Physics and Astronomy,Condensed Matter Physics,Surfaces and Interfaces,General Chemistry

Reference71 articles.

1. UV-a treatment of ZrO2 thin films fabricated by environmental friendlier water-based solution processing: Structural and optical studies;Bashir;Coatings,2021

2. Structural and Optical Properties of Zirconia Thin Films;Ali,2015

3. Next generation ferroelectric materials for semiconductor process integration and their applications;Mikolajick;J Appl Phys,2021

4. Growth, dielectric properties, and memory device applications of ZrO2 thin films;Panda;Thin Solid Films,2013

5. Atomic layer deposition of high k dielectric and metal gate stacks for MOS devices;Senzaki;AIP Conf Proc,2005

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3