Comprehensive investigation of Er2O3 thin films grown with different ALD approaches-Reference-Cited by-同舟云学术

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Comprehensive investigation of Er2O3 thin films grown with different ALD approaches

Published:2022-11 Issue: Volume:34 Page:102377
ISSN:2468-0230
Container-title:Surfaces and Interfaces
language:en
Short-container-title:Surfaces and Interfaces

Author:

Khomenkova L.^ORCID,Merabet H.^ORCID,Chauvat M.-P.^ORCID,Frilay C.,Portier X.,Labbe C.,Marie P.,Cardin J.,Boudin S.,Rueff J.-M.,Gourbilleau F.^ORCID

Funder

Qatar National Research Fund

Agence Nationale de la Recherche

Centre National de la Recherche Scientifique

European Regional Development Fund

Région Normandie

Qatar Foundation

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,General Physics and Astronomy,Condensed Matter Physics,Surfaces and Interfaces,General Chemistry

Reference50 articles.

1. A brief review of atomic layer deposition: from fundamentals to applications;Johnson;Mater. Today,2014

2. Coatings strategies for atomic layer deposition;Hu;Nanotechnol. Rev.,2017

3. Status and prospects of plasma-assisted atomic layer deposition;Knoops;J. Vac. Sci. Technol. A,2019

4. Atomic layer deposition: an overview;George;Chem. Rev.,2010

5. Lanthanide rare earth oxide thin film as an alternative gate oxide;Goh;Mater. Sci. Semicond. Process.,2017

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2. Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements;Advanced Materials Interfaces;2024-08-23

3. Tailoring the Magnetic, Structural and Shielding Characteristics of Nano Er₂O₃ via Ni Doping;ECS Journal of Solid State Science and Technology;2024-08-01

4. Thermal atomic layer deposition of Er₂O₃ films from a volatile, thermally stable enaminolate precursor;Dalton Transactions;2023

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