Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source-Reference-Cited by-同舟云学术

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Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

Published:2005 Issue:6 Volume:23 Page:2840
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Naulleau Patrick,Cain Jason P.,Anderson Erik,Dean Kim,Denham Paul,Goldberg Kenneth A.,Hoef Brian,Jackson Keith

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 极紫外（EUV）光刻胶的研发;Laser & Optoelectronics Progress;2022

2. Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications;ACS Applied Materials & Interfaces;2016-12-27

3. Chemistry and processing of resists for nanolithography;Nanolithography;2014

4. 22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool;Microelectronic Engineering;2009-04

5. The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond;Alternative Lithographic Technologies;2009-03-13

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