Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications-Reference-Cited by-同舟云学术

Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications

Published:2016-12-27 Issue:1 Volume:9 Page:17-21
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Reddy Pulikanti Guruprasad¹,Pal Satyendra Prakash¹,Kumar Pawan¹,Pradeep Chullikkattil P.¹^ORCID,Ghosh Subrata¹,Sharma Satinder K.¹,Gonsalves Kenneth E.¹

Affiliation:

1. School of Basic Sciences and ‡School of Computing and Electrical Engineering, Indian Institute of Technology Mandi, Kamand 175 005, Himachal Pradesh, India

Funder

Intel Corporation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.6b10384

Reference27 articles.

1. ITRS, The InternationalTechnology Roadmap for Semiconductors, (2015, available via the Internet athttp://www.itrs.net.

2. ITRS lithography roadmap: 2015 challenges

3. Chemistry of photolithographic imaging materials based on the chemical amplification concept