22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool-Reference-Cited by-同舟云学术

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Published:2009-04 Issue:4-6 Volume:86 Page:448-455
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Naulleau Patrick P.,Anderson Christopher N.,Chiu Jerrin,Denham Paul,George Simi,Goldberg Kenneth A.,Goldstein Michael,Hoef Brian,Hudyma Russ,Jones Gideon,Koh Chawon,Fontaine Bruno La,Ma Andy,Montgomery Warren,Niakoula Dimitra,Park Joo-on,Wallow Tom,Wurm Stefan

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

2. High-resolution EUV imaging tools for resist exposure and aerial image monitoring

3. Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)

4. First performance results of the ASML alpha demo tool

5. Nikon EUVL development progress summary

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