Chemistry and processing of resists for nanolithography-Reference-Cited by-同舟云学术

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Chemistry and processing of resists for nanolithography

Published:2014 Issue: Volume: Page:194-286
ISSN:
Container-title:Nanolithography
language:
Short-container-title:

Author:

Novembre A.,Liu S.

Publisher

Elsevier

Reference267 articles.

1. Design for Manufacturability and Yield for Nano-Scale CMOS;Chiang,2007

2. Lithography challenges for 32nm technologies and beyond;Sivakumar,2006

3. Introduction to Microlithography;Thompson,1983

4. Lithographic resist materials chemistry;Reichmanis;Annual Review of Materials Science,1993

5. Molecular glass resists for next generation lithography;Krysak;Proc SPIE,2009

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