Initial Strategies for 3D RAP Processing of Optical Surfaces Based on a Temperature Adaptation Approach

Author:

Castelli M.,Jourdain R.,McMeeking G.,Morantz P.,Shore P.,Proscia D.,Subrahmanyan P.

Publisher

Springer London

Reference5 articles.

1. Fanara C, Shore P, Nicholls JR, Lyford N, Kelley J, Carr J, Sommer P, (2006) A New Reactive Atom Plasma Technology (RAPT) for Precision Machining: the Etching of ULE® Surfaces. Advanced Engineering Materials 8 (10): 933–939.

2. Fanara C, O’Brien W, Shore P, Nicholls JR, Sommer R, (2007) Reactive Atom Plasma Technology (RAP® ) etching of ULE® and SiC optics. TPW, 5th Technological Plasmas Workshop, Belfast.

3. Jourdain R, Shore P, Proscia D, Subrahmanyan P, (2009) Novel Plasma Surface Figuring Facility Designed for Effective Production of Large Scale Optical Surfaces. JEOS conference, Munich.

4. Allen LN, Roming HW, (1990) Demonstration of an ion figuring process. Advanced Optical Manufacturing and Testing – Proceeding of SPIE 1333: 22–33.

5. Hänsel T, Frost F, Nickel A, Schindler A, (2007) Ultraprecision Surface Finishing by Ion Beam Techniques. Vakuum in Forschung und Praxis 5 (19): 24–30.

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