Experimental analysis of current conduction through thermally grown SiO2 on thick epitaxial 4H-SiC employing Poole-Frenkel mechanism

Author:

Gupta Sanjeev K.,Azam A.,Akhtar J.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy

Reference12 articles.

1. M N Yoder, IEEE Trans. Electron. Devices 43, 1633 (1996)

2. Samuele Porro, Rafal R Ciechonski, Mikael Syväjärvi and Rositza Yakimova, Phys. Status Solidi A202(13), 2508 (2005)

3. Gary L Harris, Properties of silicon carbide, United Kingdom INSPEC, The Institution of Electrical Engineers, London (1995)

4. Zhe Chuan Feng and Jian H Zhao, Silicon carbide materials, processing and devices (Taylor & Francis Books, Inc., New York, 2004)

5. Michael Shur, Sergey Rumyantsev and Michael Levinshtein, Silicon carbide materials and devices (World Scientific, Singapore, 2006) Vol. 1

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