The effects of carbon on the bidirectional threshold voltage instabilities induced by negative gate bias stress in GaN MIS-HEMTs
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Published:2020-08-24
Issue:4
Volume:19
Page:1555-1563
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ISSN:1569-8025
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Container-title:Journal of Computational Electronics
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language:en
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Short-container-title:J Comput Electron
Author:
Zagni NicolòORCID, Chini AlessandroORCID, Puglisi Francesco MariaORCID, Pavan PaoloORCID, Verzellesi GiovanniORCID
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Modelling and Simulation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference38 articles.
1. Chen, K.J., Haberlen, O., Lidow, A., Tsai, C.L., Ueda, T., Uemoto, Y., Wu, Y.: GaN-on-Si power technology: devices and applications. IEEE Trans. Electron Devices 64, 779–795 (2017). https://doi.org/10.1109/TED.2017.2657579 2. Amano, H., Baines, Y., Beam, E., Borga, M., Bouchet, T., Chalker, P.R., Charles, M., Chen, K.J., Chowdhury, N., Chu, R., De Santi, C., De Souza, M.M., Decoutere, S., Di Cioccio, L., Eckardt, B., Egawa, T., Fay, P., Freedsman, J.J., Guido, L., Häberlen, O., Haynes, G., Heckel, T., Hemakumara, D., Houston, P., Hu, J., Hua, M., Huang, Q., Huang, A., Jiang, S., Kawai, H., Kinzer, D., Kuball, M., Kumar, A., Lee, K.B., Li, X., Marcon, D., März, M., McCarthy, R., Meneghesso, G., Meneghini, M., Morvan, E., Nakajima, A., Narayanan, E.M.S., Oliver, S., Palacios, T., Piedra, D., Plissonnier, M., Reddy, R., Sun, M., Thayne, I., Torres, A., Trivellin, N., Unni, V., Uren, M.J., Van Hove, M., Wallis, D.J., Wang, J., Xie, J., Yagi, S., Yang, S., Youtsey, C., Yu, R., Zanoni, E., Zeltner, S., Zhang, Y.: The 2018 GaN power electronics roadmap. J. Phys. D Appl. Phys. 51, 163001 (2018). https://doi.org/10.1088/1361-6463/aaaf9d 3. Dogmus, E., Zegaoui, M., Medjdoub, F.: GaN-on-silicon high-electron-mobility transistor technology with ultra-low leakage up to 3000 V using local substrate removal and AlN ultra-wide bandgap. Appl. Phys. Express 11, 034102 (2018). https://doi.org/10.7567/APEX.11.034102 4. Del Alamo, J.A., Lee, E.S.: Stability and reliability of lateral GaN power field-effect transistors. IEEE Trans. Electron Devices 66, 4578–4590 (2019). https://doi.org/10.1109/TED.2019.2931718 5. Hua, M., Wei, J., Bao, Q., Zhang, Z., Zheng, Z., Chen, K.J.: Dependence of VTH stability on gate-bias under reverse-bias stress in E-mode GaN MIS-FET. IEEE Electron Device Lett. 39, 413–416 (2018). https://doi.org/10.1109/LED.2018.2791664
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