Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films-Reference-Cited by-同舟云学术

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Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films

Published:2019-08-02 Issue:5 Volume:42 Page:
ISSN:0250-4707
Container-title:Bulletin of Materials Science
language:en
Short-container-title:Bull Mater Sci

Author:

Kumar Dhruva,Ghadai Ranjan Kr,Das Soham,Sharma Ashis,Swain Bibhu P

Publisher

Springer Science and Business Media LLC

Subject

Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/s12034-019-1937-7.pdf

Reference38 articles.

1. Bhattacharyya A S, Mishra S K and Mukherjee S 2010 J. Vac. Sci. Technol., A 28 505

2. Ma B, Wang Y, Wang K, Li X, Liu J and An L 2015 Acta Mater. 89 215

3. Cao Z X 2001 Thin Solid Films 401 94

4. Swain B P and Hwang N M 2008 Appl. Surf. Sci. 254 5319

5. Bhattacharyya A S and Mishra S K 2010 J. Micromech. Microeng. 21 015011

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1. Investigation of silicon carbon oxynitride thin film deposited by RF magnetron sputtering;Applied Surface Science Advances;2024-02

2. Impact of elevated temperature over different properties of CVD SiCN coating developed in Nitrogen gas atmosphere;Silicon;2022-02-03

3. Optical and photoelectrochemical properties of nitrogen-doped a-SiC thin films deposited by reactive sputtering method at room temperature;Advances in Materials and Processing Technologies;2021-03-07

4. Growth of large-scale two-dimensional insulator Na2Ta4O11 through chemical vapor deposition;Journal of Semiconductors;2020-07-01

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