Self-assembled nanolayers as interfacial diffusion barriers for thermally stable and low contact resistance Cu source/drain electrode in a-Si:H TFT-LCDs-Reference-Cited by-同舟云学术

Self-assembled nanolayers as interfacial diffusion barriers for thermally stable and low contact resistance Cu source/drain electrode in a-Si:H TFT-LCDs

Published:2012-02 Issue:1 Volume:8 Page:21-25
ISSN:1738-8090
Container-title:Electronic Materials Letters
language:en
Short-container-title:Electron. Mater. Lett.

Author:

Han Jung Suk,Lee Chiyoung,Lee Jaegab

Publisher

Springer Science and Business Media LLC

Subject

Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s13391-011-1092-9.pdf

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