Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
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1. Atomic layer deposition of thin films: from a chemistry perspective;International Journal of Extreme Manufacturing;2023-06-14
2. Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors;Journal of Vacuum Science & Technology A;2021-12
3. Performance of WCN diffusion barrier for Cu multilevel interconnects;Japanese Journal of Applied Physics;2018-02-19
4. Plasma-enhanced atomic layer deposition of tungsten nitride;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-09
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