Modelling the Oxide and the Oxidation Process
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Publisher
Springer Netherlands
Link
http://link.springer.com/content/pdf/10.1007/978-94-011-5008-8_6
Reference30 articles.
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3. Stoneham, AM. and Tasker, P.W., (1987) Image charges and their influence on the growth and the nature of thin oxide films, Phil Mag B55 237–252.
4. Torres, V.J.B., Stoneham, AM., Sofield, C.J., Harker, AH., and Clement, C.F., (1995), Early stages of silicon oxidation, Interface Science 3 131–144.
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Atomic transport during growth of ultrathin dielectrics on silicon;Surface Science Reports;1999-12
2. Dynamics of Silicon Oxidation;MRS Proceedings;1999
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