Image charges and their influence on the growth and the nature of thin oxide films
Author:
Affiliation:
1. a Theoretical Physics Division , Harwell Laboratory , Oxon , OX11 , ORA , England
Publisher
Informa UK Limited
Subject
General Physics and Astronomy,General Chemical Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/13642818708211206
Reference14 articles.
1. Low-pressure oxidation of silicon stimulated by low-energy electron bombardment
2. General Relationship for the Thermal Oxidation of Silicon
3. Oxidation of silicon: strain and linear kinetics
4. Vacancy formation energies near the surface of an ionic crystal
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