Author:
Vijaya H. S.,Mohan Rao G.,Mohan S.,Muralidhar G. K.,Subbanna G. N.
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Metals and Alloys,Mechanics of Materials,Condensed Matter Physics
Reference16 articles.
1. J. Kong, H. Shen, B. Chen, Z. Li, W. Shi, W. Yao, and Zh. Qi: Thin Solid Films, 1992, vol. 207, pp. 51–53.
2. H. Ljungcrantz, L. Hultman, and J.E. Sundgren: J. Vac. Sci. Technol. A, 1993, vol. 11, pp. 543–53.
3. F.A. Smidt: Int. Mater. Rev., 1990, vol. 35, pp. 61–128.
4. B.D. Cullity: Elements of X-Ray Diffraction, Addison-Wesley Publishing Company, London, 1967, pp. 444–53.
5. W.D. Westwood: Progr. Surface Sci., 1976, vol. 7, pp. 71–111.
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