Effects of deposition sequence on electrical properties of InAs–Ni–W Ohmic contacts to n-type GaAs
Author:
Affiliation:
1. Division of Materials Science and Engineering, Department of Engineering Science, Kyoto University
2. Mitsui Mining & Smelting Co., LTD.
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/37/4/37_4_670/_pdf
Reference26 articles.
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3. 3) E. F. Hockings, I. Kudman, T. E. Seidel, C. M. Schmelts, and E. F. Steigmeier: J. Appl. Phys., 37 (1966) 2879.
4. 4) H. -J. Kim, M. Murakami, W. H. Price, and M. Norcott: J. Appl. Phys., 67 (1990) 4183.
5. 5) M. Murakami and W. H. Price: Appl. Phys. Lett., 51 (1987) 664.
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