Performance Improvement for Spray-Coated ZnO TFT by F Doping With Spray-Coated Zr–Al–O Gate Insulator-Reference-Cited by-同舟云学术

Performance Improvement for Spray-Coated ZnO TFT by F Doping With Spray-Coated Zr–Al–O Gate Insulator

Published:2021-03 Issue:3 Volume:68 Page:1063-1069
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Saha Jewel Kumer^ORCID,Ali Arqum^ORCID,Bukke Ravindra Naik^ORCID,Kim Youn Goo^ORCID,Islam Md Mobaidul^ORCID,Jang Jin^ORCID

Funder

Technology Innovation Program or Industrial Strategic Technology Development Program

Development of Non-Planar TFT Structures and Processes for Ultrahigh Resolution Display Funded by the Ministry of Trade, Industry and Energy (MOTIE), South Korea

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/16/9361759/09336340.pdf?arnumber=9336340

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