Throughput enhancement strategy of maskless electron beam direct writing for logic device-Reference-Cited by-同舟云学术

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Throughput enhancement strategy of maskless electron beam direct writing for logic device

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Container-title:International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138)
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Author:

Inanami R.,Magoshi S.,Kousai S.,Hmada M.,Takayanagi T.,Sugihara K.,Okumura K.,Kuroda T.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/7241/19535/00904446.pdf?arnumber=904446

Cited by 34 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Line-edge quality optimization of electron beam resist for high-throughput character projection exposure utilizing atomic force microscope analysis;SPIE Proceedings;2017-04-04

2. Electron-beam lithography with character projection technique for high-throughput exposure with line-edge quality control;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-09-08

3. Electron-beam lithography with character projection exposure for throughput enhancement with line-edge quality optimization;SPIE Proceedings;2016-03-16

4. E-Beam Lithography Character and Stencil Co-Optimization;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2014-05

5. A Structured Routing Architecture for Practical Application of Character Projection Method in Electron-Beam Direct Writing;IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences;2014

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