Electron-beam lithography with character projection technique for high-throughput exposure with line-edge quality control-Reference-Cited by-同舟云学术

Electron-beam lithography with character projection technique for high-throughput exposure with line-edge quality control

Published:2016-09-08 Issue:3 Volume:15 Page:031606
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ikeno Rimon¹,Maruyama Satoshi¹,Mita Yoshio²,Ikeda Makoto²,Asada Kunihiro¹

Affiliation:

1. University of Tokyo, VLSI Design and Education Center, Yayoi 2-11-16, Bunkyo-ku, Tokyo 113-0032, Japan

2. University of Tokyo, Department of Electrical Engineering and Information Systems, Hongo 7-3-1, Bunkyo-ku, Tokyo 113-0033, Japan

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Variable spot shaping for electron‐beam lithography

2. Recent advances in electron-beam lithography for the high-volume production of VLSI devices

3. Electron beams in individual column cells of multicolumn cell system

4. Throughput enhancement strategy of maskless electron beam direct writing for logic device

5. Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment

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