Author:
Ikeno Rimon,Maruyama Satoshi,Mita Yoshio,Ikeda Makoto,Asada Kunihiro
Reference11 articles.
1. Variable spot shaping for electron‐beam lithography
2. Recent advances in electron-beam lithography for the high-volume production of VLSI devices
3. Electron beams in individual column cells of multicolumn cell system
4. Inanami R., Magoshi S., Kosai S., Hamada M., Takayanagi T., Sugihara K., Okumura K., and Kuroda T., “Throughput enhancement strategy of maskless electron beam direct writing for logic device,” Proc. 2000 IEEE International Electron Devices Meeting (IEDM 2000), 833–836 (2000).
5. Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment
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