A novel dual-tone molecular glass resist based on adamantane derivatives for electron beam lithography-Reference-Cited by-同舟云学术

A novel dual-tone molecular glass resist based on adamantane derivatives for electron beam lithography

Published:2022 Issue:26 Volume:10 Page:9858-9866
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Hu Shengwen¹,Chen Jinping¹^ORCID,Yu Tianjun¹^ORCID,Zeng Yi¹^ORCID,Wang Shuangqing²^ORCID,Guo Xudong²,Yang Guoqiang²^ORCID,Li Yi¹^ORCID

Affiliation:

1. Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing, China

2. Beijing National Laboratory for Molecular Sciences (BNLMS), Key Laboratory of Photochemistry, Institute of Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing, China

Abstract

A novel dual-tone molecular glass (AD-10Boc) resist was developed for electron beam lithography. The AD-10Boc resist can resolve dense line patterns of 21 nm and 30 nm L/S for negative-tone and positive-tone development, respectively.

Funder

National Natural Science Foundation of China

Chinese Academy of Sciences

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/TC/D2TC01339H

Reference55 articles.

1. New Generation Electron Beam Resists: A Review

2. Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale